Samsung is developing technology that combines quantum computing and artificial intelligence to simulate and improve photolithography, one of the most important stages of semiconductor manufacturing.
Samsung SDS, the group’s information technology subsidiary, is leading the project. The company reportedly plans to test the technology through a proof of concept during the second half of 2026. If successful, Samsung SDS is expected to share the system with Samsung Electronics for use in its semiconductor operations.
Quantum Lithography Project
Photolithography transfers extremely small circuit patterns onto silicon wafers using light. The patterns form the foundation for the transistors and other components that make up a chip.
Advanced chip production relies on sophisticated lithography scanners, including systems manufactured by Dutch equipment company ASML. These machines project circuit designs through a mask and onto a light-sensitive layer placed on the wafer.
Because lithography determines how accurately manufacturers can print circuits, it has a major effect on chip density and production yield.
Density refers to the number of transistors that manufacturers can place within a certain chip area. Yield refers to the number of usable chips produced from each wafer.
How It Would Work
Samsung is developing algorithms that can simulate the lithography process before manufacturers carry it out on physical wafers.
Quantum computers would handle the main calculations required by the simulation, while conventional computers would process the resulting data. Artificial intelligence would then identify and correct potential patterning errors.
Samsung SDS has reportedly already secured some of the required algorithms and will use the proof-of-concept stage to determine whether they can work effectively in a semiconductor manufacturing environment.
The system would allow Samsung to test circuit patterns virtually before moving to the costly physical production stage.
Potential Benefits
Accurate simulations could help Samsung detect lithography problems earlier and reduce the number of physical testing cycles required to develop new manufacturing processes.
The technology could also reduce the time and cost involved in patterning and etching wafers.
By identifying defects before production, Samsung could potentially increase the number of working chips obtained from each wafer. More accurate patterning could also allow the company to place additional transistors within a smaller area, improving chip density.
Samsung expects the combination of quantum calculations, conventional computing and AI-based correction to support the development of more advanced semiconductor processes.
Existing AI Use
Artificial intelligence is already being used to improve computational lithography.
Samsung previously said it had achieved a 20-fold increase in computational lithography performance by using Nvidia’s cuLitho platform and CUDA-X libraries for optical proximity correction.
Optical proximity correction predicts and adjusts pattern variations that can occur when circuit designs are transferred onto wafers. Samsung said the technology could improve patterning accuracy and shorten chip-development cycles.
Samsung’s latest project would expand this approach by adding quantum computing to the simulation process. However, the technology remains under development, and its effectiveness will depend on the results of the planned proof of concept.
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